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re: Sealed Industrial Sources
- To: " - (052)radsafe(a)romulus.ehs.uiuc.edu"<radsafe@romulus.ehs.uiuc.edu>
- Subject: re: Sealed Industrial Sources
- From: MVala@USCCMAIL.uscc.bms.com
- Date: Mon, 07 Oct 1996 16:34:25 -0500
- X400-Content-Type: P2-1988 (22)
- X400-Mts-Identifier: [/PRMD=BRIMYSQ/ADMD=MARK400/C=US/;0004700007289350000002]
- X400-Originator: MVala@USCCMAIL.uscc.bms.com
- X400-Recipients: radsafe@romulus.ehs.uiuc.edu
Mike G. -
I think what you are referring to was the Po-210 static eliminators
recall in 1987 or 1988. The polonium was encased in ceramic
microspheres and these microspheres were epoxied to the inside radius
of an airline. Air was blown through these devices to eliminate
static charge on process lines and other equipment. Apparently dirt
and grease from the air blowing through the line corroded the epoxy in
some of these devices and the microspheres were blown out onto the
process line area. One pharmaceutical facility in NJ, not the one I
work for :-), was contaminated. I believe they found contamination in
the processing area, cafeteria, and employee's cars.
As I recall, since the Po-210 was encapsulated, very little internal
dose would be experienced if the microsphere was ingested of inhaled.
The microsphere was large enough to be cleared by the nasal passages
and durable enough to withstand the GI tract.
Regards,
Mike Vala
mvala@usccmail.bms.com
------------------------------
Date: Mon, 07 Oct 1996 07:58:14 -0700
From: "Michael P. Grissom" <mikeg@SLAC.Stanford.EDU>
Subject: Re: Working life of sealed industrial sources
Radsafers,
I believe one of the more notorious failures may have been,
as Wes Dunn noted earlier, more one of device. That is, some
years ago industrial air cleaners used Ra-226 sources in the
nozzles (?) to de-ionize air.
Rumor has it that source material was released into many
containers being "cleaned". Unfortunately, the company was
a major food processor and containers (filled with food) so
cleaned apparently did make it to market.
Anyone recall the particulars?
S.,
MikeG